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Peculiarities of the 7 × 7 to 5 × 5 superstructure transition during epitaxial growth of germanium on silicon (111) surface V. V. Dirko, K. A. Lozovoy, A. P. Kokhanenko [et al.]

Contributor(s): Dirko, Vladimir V | Lozovoy, Kirill A | Kokhanenko, Andrey P | Kukenov, Olzhas I | Korotaev, Alexander G | Voytsekhovskiy, Alexander VMaterial type: ArticleArticleContent type: Текст Media type: электронный Subject(s): двумерные материалы | двумерные структуры | молекулярно-лучевая эпитаксия | кремний | германий | дифракция быстрых электронов на отражениеGenre/Form: статьи в журналах Online resources: Click here to access online In: Nanomaterials Vol. 13, № 2. P. 231 (1-12)Abstract: This paper presents the results of studying the processes of epitaxial growth of germanium on silicon with crystallographic orientation (111) in a wide temperature range. The temperature dependences of the duration of the transition stage from the 7 × 7 to 5 × 5 superstructure and the values of the critical thickness of the transition from two-dimensional to three-dimensional growth in the range from 250 to 700 ◦C are determined using the reflection high-energy electron diffraction method. It was shown for the first time that the transition time from the 7 × 7 superstructure to 5 × 5 superstructure depends on the temperature of epitaxial growth. The region of low temperatures of synthesis, which has received insufficient attention so far, is also considered.
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This paper presents the results of studying the processes of epitaxial growth of germanium on silicon with crystallographic orientation (111) in a wide temperature range. The temperature dependences of the duration of the transition stage from the 7 × 7 to 5 × 5 superstructure and the values of the critical thickness of the transition from two-dimensional to three-dimensional growth in the range from 250 to 700 ◦C are determined using the reflection high-energy electron diffraction method. It was shown for the first time that the transition time from the 7 × 7 superstructure to 5 × 5 superstructure depends on the temperature of epitaxial growth. The region of low temperatures of synthesis, which has received insufficient attention so far, is also considered.

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