Microstructure and properties of a silicon coating deposited on a titanium nickelide substrate using molecular-beam epitaxy equipment K. V. Krukovskii, O. A. Kashin, A. V. Luchin [et al.]
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ArticleContent type: Текст Media type: электронный Subject(s): молекулярно-лучевая эпитаксия | никелид титана | микроструктура | кремниевое покрытиеGenre/Form: статьи в журналах Online resources: Click here to access online
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Journal of Physics: Conference Series Vol. 1954. P. 012024 (1-4)Abstract: The microstructure and properties of a silicon coating on a titanium nickelide substrate were studied to assess the possibility of using such a coating to improve the biocompatibility of medical implants. The silicon coating with thickness of 4.0±0.5 microns was applied to the TiNi substrate on a molecular beam epitaxy unit. The coating had a submicrocrystalline structure with a crystallite size of 0.1...0.2 microns, a developed surface, and high crack resistance.
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The microstructure and properties of a silicon coating on a titanium nickelide substrate were studied to assess the possibility of using such a coating to improve the biocompatibility of medical implants. The silicon coating with thickness of 4.0±0.5 microns was applied to the TiNi substrate on a molecular beam epitaxy unit. The coating had a submicrocrystalline structure with a crystallite size of 0.1...0.2 microns, a developed surface, and high crack resistance.
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