Effect of bias voltage on coating homogeneity in plasma immersion ion implantation V. A. Slabodchikov, D. P. Borisov, V. M. Kuznetsov
Material type:
ArticleSubject(s): напряжение смещения | гомогенность | ионная имплантация | плазма | никель-титановые сплавыGenre/Form: статьи в журналах Online resources: Click here to access online
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AIP Conference Proceedings Vol. 1783. P. 020209-1-020209-4Abstract: The paper presents research results demonstrating the influence of bias on the homogeneity of plasma immersion ion implantation. The research results allow the conclusion that plasma immersion ion implantation can be used to advantage for surface modification of medical materials, e.g., nickel-titanium (NiTi) alloys. In particular, doing of NiTi with silicon at pulsed bias provides highly homogeneous surface treatment.
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The paper presents research results demonstrating the influence of bias on the homogeneity of plasma immersion ion implantation. The research results allow the conclusion that plasma immersion ion implantation can be used to advantage for surface modification of medical materials, e.g., nickel-titanium (NiTi) alloys. In particular, doing of NiTi with silicon at pulsed bias provides highly homogeneous surface treatment.
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