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Subsecond Annealing of Advanced Materials electronic resource Annealing by Lasers, Flash Lamps and Swift Heavy Ions / edited by Wolfgang Skorupa, Heidemarie Schmidt.

Contributor(s): Skorupa, Wolfgang [editor.] | Schmidt, Heidemarie [editor.] | SpringerLink (Online service)Material type: TextTextSeries: Springer Series in Materials SciencePublication details: Cham : Springer International Publishing : Imprint: Springer, 2014Description: XVII, 321 p. 205 illus., 59 illus. in color. online resourceContent type: text Media type: computer Carrier type: online resourceISBN: 9783319031316Subject(s): Microwaves | Optical materials | Materials Science | Optical and Electronic Materials | Laser Technology, Photonics | Semiconductors | Microwaves, RF and Optical Engineering | Surface and Interface Science, Thin FilmsDDC classification: 620.11295 | 620.11297 LOC classification: TA1750-1750.22Online resources: Click here to access online
Contents:
From the Contents: The very early time -- Nanonet formation by constitutional supercooling of pulsed laser annealed, Mn-implanted germanium -- Metastable activation of dopants by solid phase epitaxial recrystallization -- Superconducting Ga-implanted Germanium -- Structural changes in SiGe/Si layers induced by fast crystallization.
In: Springer eBooksSummary: The thermal processing of materials ranges from few femtoseconds by Swift Heavy Ion Implantation to about one second using advanced Rapid Thermal Annealing. This book offers after an historical excursus selected contributions on fundamental and applied aspects of thermal processing of classical elemental semiconductors and other advanced materials including nanostructures with novel optoelectronic, magnetic, and superconducting properties. Special emphasis is given on the diffusion and segregation of impurity atoms during thermal treatment. A broad range of examples describes the solid phase and/or liquid phase processing of elemental and compound semiconductors, dielectric composites and organic materials.
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From the Contents: The very early time -- Nanonet formation by constitutional supercooling of pulsed laser annealed, Mn-implanted germanium -- Metastable activation of dopants by solid phase epitaxial recrystallization -- Superconducting Ga-implanted Germanium -- Structural changes in SiGe/Si layers induced by fast crystallization.

The thermal processing of materials ranges from few femtoseconds by Swift Heavy Ion Implantation to about one second using advanced Rapid Thermal Annealing. This book offers after an historical excursus selected contributions on fundamental and applied aspects of thermal processing of classical elemental semiconductors and other advanced materials including nanostructures with novel optoelectronic, magnetic, and superconducting properties. Special emphasis is given on the diffusion and segregation of impurity atoms during thermal treatment. A broad range of examples describes the solid phase and/or liquid phase processing of elemental and compound semiconductors, dielectric composites and organic materials.

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